| The GIANO-TNG spectrometer E Oliva, L Origlia, C Baffa, C Biliotti, P Bruno, F D'Amato, C Del Vecchio, ... Ground-based and Airborne Instrumentation for Astronomy 6269, 431-440, 2006 | 84 | 2006 |
| Modal wavefront reconstruction from its gradient I Mochi, KA Goldberg Applied Optics 54 (12), 3780-3785, 2015 | 77 | 2015 |
| Fluorescence lidar imaging of the cathedral and baptistery of Parma D Lognoli, G Cecchi, I Mochi, L Pantani, V Raimondi, R Chiari, ... Applied Physics B 76, 457-465, 2003 | 68 | 2003 |
| Commissioning an EUV mask microscope for lithography generations reaching 8 nm KA Goldberg, I Mochi, M Benk, AP Allezy, MR Dickinson, CW Cork, ... Extreme Ultraviolet (EUV) Lithography IV 8679, 347-356, 2013 | 55 | 2013 |
| Printability of native blank defects and programmed defects and their stack structures HJ Kwon, J Harris-Jones, R Teki, A Cordes, T Nakajima, I Mochi, ... Photomask Technology 2011 8166, 60-69, 2011 | 54 | 2011 |
| The GIANO spectrometer: towards its first light at the TNG E Oliva, L Origlia, R Maiolino, C Baffa, V Biliotti, P Bruno, G Falcini, ... Ground-based and Airborne Instrumentation for Astronomy IV 8446, 1307-1315, 2012 | 52 | 2012 |
| Actinic imaging of native and programmed defects on a full-field mask I Mochi, KA Goldberg, B La Fontaine, A Tchikoulaeva, C Holfeld Extreme Ultraviolet (EUV) Lithography 7636, 425-433, 2010 | 46 | 2010 |
| RESCAN: an actinic lensless microscope for defect inspection of EUV reticles I Mochi, P Helfenstein, I Mohacsi, R Rajeev, D Kazazis, S Yoshitake, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 16 (4), 041003-041003, 2017 | 38 | 2017 |
| Progress in EUV resists towards high-NA EUV lithography X Wang, Z Tasdemir, I Mochi, M Vockenhuber, L van Lent-Protasova, ... Extreme Ultraviolet (EUV) Lithography X 10957, 19-27, 2019 | 34 | 2019 |
| Actinic extreme ultraviolet mask inspection beyond 0.25 numericalaperture KA Goldberg, P Naulleau, I Mochi, EH Anderson, SB Rekawa, CD Kemp, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2008 | 34 | 2008 |
| Wavelength-specific reflections: A decade of extreme ultraviolet actinic mask inspection research KA Goldberg, I Mochi Journal of Vacuum Science & Technology B 28 (6), C6E1-C6E10, 2010 | 33 | 2010 |
| Extreme ultraviolet laser-based table-top aerial image metrology of lithographic masks F Brizuela, S Carbajo, A Sakdinawat, D Alessi, DH Martz, Y Wang, ... Optics Express 18 (14), 14467-14473, 2010 | 32 | 2010 |
| Towards X-ray transient grating spectroscopy C Svetina, R Mankowsky, G Knopp, F Koch, G Seniutinas, B Rösner, ... Optics letters 44 (3), 574-577, 2019 | 31 | 2019 |
| GIANO-TNG spectroscopy of red supergiants in the young star cluster RSGC2 L Origlia, E Oliva, R Maiolino, A Mucciarelli, C Baffa, V Biliotti, P Bruno, ... Astronomy & Astrophysics 560, A46, 2013 | 31 | 2013 |
| Mixed-ligand zinc-oxoclusters: efficient chemistry for high resolution nanolithography N Thakur, R Bliem, I Mochi, M Vockenhuber, Y Ekinci, S Castellanos Journal of Materials Chemistry C 8 (41), 14499-14506, 2020 | 29 | 2020 |
| Assist features: placement, impact, and relevance for EUV imaging I Mochi, V Philipsen, E Gallagher, E Hendrickx, K Lyakhova, F Wittebrood, ... Extreme Ultraviolet (EUV) Lithography VII 9776, 513-529, 2016 | 29 | 2016 |
| Beam drift and partial probe coherence effects in EUV reflective-mode coherent diffractive imaging P Helfenstein, R Rajeev, I Mochi, A Kleibert, CAF Vaz, Y Ekinci Optics Express 26 (9), 12242-12256, 2018 | 28 | 2018 |
| Lithographic performance of ZEP520A and mr-PosEBR resists exposed by electron beam and extreme ultraviolet lithography R Fallica, D Kazazis, R Kirchner, A Voigt, I Mochi, H Schift, Y Ekinci Journal of Vacuum Science & Technology B 35 (6), 2017 | 28 | 2017 |
| An EUV Fresnel zoneplate mask-imaging microscope for lithography generations reaching 8 nm KA Goldberg, I Mochi, SB Rekawa, NS Smith, JB Macdougall, ... Extreme Ultraviolet (EUV) Lithography II 7969, 331-342, 2011 | 28 | 2011 |
| A study of defects on EUV masks using blank inspection, patterned mask inspection, and wafer inspection S Huh, L Ren, D Chan, S Wurm, K Goldberg, I Mochi, T Nakajima, ... Extreme ultraviolet (EUV) lithography 7636, 182-188, 2010 | 28 | 2010 |
Kenneth A. GoldbergOptical Physicist, Advanced Light Source, Lawrence Berkeley National LaboratoryVerified email at lbl.gov
