| Simulation and compensation methods for EUV lithography masks with buried defects CH Clifford UC Berkeley, 2010 | 43 | 2010 |
| Fast simulation methods and modeling for extreme ultraviolet masks with buried defects CH Clifford, AR Neureuther Journal of Micro/Nanolithography, MEMS, and MOEMS 8 (3), 031402-031402-8, 2009 | 41 | 2009 |
| Compensation for EUV multilayer defects within arbitrary layouts by absorber pattern modification LL Pang, C Clifford, P Hu, D Peng, Y Li, D Chen, M Satake, V Tolani, L He Extreme Ultraviolet (EUV) Lithography II 7969, 79691E, 2011 | 25 | 2011 |
| Smoothing based fast model for images of isolated buried EUV multilayer defects CH Clifford, AR Neureuther SPIE Advanced Lithography, 692119-692119-10, 2008 | 24 | 2008 |
| Compensation methods using a new model for buried defects in extreme ultraviolet lithography masks CH Clifford, TT Chan, AR Neureuther, Y Li, D Peng, L Pang SPIE Photomask Technology, 78230V-78230V-10, 2010 | 23 | 2010 |
| Accurate 3DEMF mask model for full-chip simulation MC Lam, K Adam, D Fryer, C Zuniga, H Wei, M Oliver, CH Clifford SPIE Advanced Lithography, 86831D-86831D-9, 2013 | 22 | 2013 |
| Compensation methods for buried defects in extreme ultraviolet lithography masksa) CH Clifford, TT Chan, AR Neureuther Journal of Vacuum Science & Technology B 29 (1), 011022, 2011 | 22 | 2011 |
| Technique for repairing a reflective photo-mask L Pang, CH Clifford US Patent 8,612,903, 2013 | 19 | 2013 |
| Compensation methods for buried defects in extreme ultraviolet lithography masks CH Clifford, TT Chan, AR Neureuther Extreme Ultraviolet (EUV) Lithography 7636, 763623, 2010 | 19 | 2010 |
| EUV OPC for the 20-nm node and beyond CH Clifford, Y Zou, A Latypov, O Kritsun, T Wallow, HJ Levinson, F Jiang, ... SPIE Advanced Lithography, 83221M-83221M-14, 2012 | 15 | 2012 |
| Methods for optical proximity correction in the design and fabrication of integrated circuits T Lukanc, CH Clifford, T Coskun US Patent 8,975,195, 2015 | 12 | 2015 |
| Wafer plane inspection evaluated for photomask production E Gallagher, K Badger, M Lawliss, Y Kodera, JT Azpiroz, S Pang, ... Photomask Technology, 71221B-71221B-9, 2008 | 11 | 2008 |
| Technique for analyzing a reflective photo-mask CH Clifford US Patent 8,555,214, 2013 | 10 | 2013 |
| Towards the optical inspection sensitivity optimization of EUV masks and EUVL-exposed wafers U Okoroanyanwu, J Heumann, X Zhu, CH Clifford, F Jiang, P Mangat, ... 28th European Mask and Lithography Conference 8352, 83520V, 2012 | 10 | 2012 |
| Investigation of buried EUV mask defect printability using actinic inspection and fast simulation CH Clifford, TT Chan, AR Neureuther, KA Goldberg, I Mochi, T Liang SPIE Photomask Technology, 74882H-74882H-10, 2009 | 10 | 2009 |
| Fast three-dimensional simulation of buried EUV mask defect interaction with absorber features CH Clifford, AR Neureuther 27th Annual BACUS Symposium on Photomask Technology, 67301S-67301S-7, 2007 | 10 | 2007 |
| Fast simulation of buried EUV mask defect interaction with absorber features CH Clifford, AR Neureuther Advanced Lithography, 65170A-65170A-10, 2007 | 10 | 2007 |
| Technique for Analyzing a Reflective Photo-Mask CH Clifford US Appl, 0 | 9 | |
| Comparison of fast three-dimensional simulation and actinic inspection for extreme ultraviolet masks with buried defects and absorber features CH Clifford, S Wiraatmadja, TT Chan, AR Neureuther, KA Goldberg, ... Journal of Vacuum Science & Technology B 27 (6), 2888-2893, 2009 | 8 | 2009 |
| Optical proximity correction for anamorphic extreme ultraviolet lithography C Clifford, M Lam, A Raghunathan, F Jiang, G Fenger, K Adam Journal of Micro/Nanolithography, MEMS, and MOEMS 16 (4), 041004, 2017 | 7 | 2017 |
