| Quantitative measurement of EUV resist outgassing G Denbeaux, R Garg, J Waterman, C Mbanaso, J Netten, R Brainard, ... 23rd European Mask and Lithography Conference, 1-5, 2007 | 32 | 2007 |
| EUV optics contamination studies in presence of selected hydrocarbons R Garg, A Wüest, E Gullikson, S Bajt, G Denbeaux Emerging Lithographic Technologies XII 6921, 871-878, 2008 | 23 | 2008 |
| EUV resist outgassing: How much is too much? KR Dean, G Debeaux, A Wüest, R Garg Journal of Photopolymer Science and Technology 20 (3), 393-402, 2007 | 23 | 2007 |
| Carbon contamination topography analysis of EUV masks YJ Fan, L Yankulin, P Thomas, C Mbanaso, A Antohe, R Garg, Y Wang, ... Extreme Ultraviolet (EUV) Lithography 7636, 149-156, 2010 | 19 | 2010 |
| Effect of carbon contamination on the printing performance of extreme ultraviolet masks YJ Fan, L Yankulin, A Antohe, P Thomas, C Mbanaso, R Garg, Y Wang, ... Journal of Vacuum Science & Technology B 28 (2), 321-328, 2010 | 11 | 2010 |
| Assumptions and trade-offs of extreme ultraviolet optics contamination modeling V Jindal, R Garg, G Denbeaux, A Wüest Alternative Lithographic Technologies 7271, 991-999, 2009 | 11 | 2009 |
| Carbon contamination of extreme ultraviolet (EUV) masks and its effect on imaging YJ Fan, L Yankulin, A Antohe, R Garg, P Thomas, C Mbanaso, A Wüest, ... Alternative Lithographic Technologies 7271, 1021-1029, 2009 | 10 | 2009 |
| EUV resist outgassing: scaling to HVM intensity AO Antohe, C Mbanaso, YJ Fan, L Yankulin, R Garg, P Thomas, ... Alternative Lithographic Technologies 7271, 612-618, 2009 | 10 | 2009 |
| Extreme ultraviolet resist outgassing and its effect on nearby optics G Denbeaux, R Garg, C Mbanaso, J Waterman, L Yankulin, A Antohe, ... Emerging Lithographic Technologies XII 6921, 439-445, 2008 | 10 | 2008 |
| A simple null-field ellipsometric imaging system (NEIS) for in-situ monitoring of EUV-induced deposition on EUV optics R Garg, N Faradzhev, S Hill, L Richter, PS Shaw, R Vest, TB Lucatorto Extreme Ultraviolet (EUV) Lithography 7636, 643-648, 2010 | 7 | 2010 |
| Negative effects of “work from home” culture during the coronavirus pandemic: a gender-based study P Rohilla, R Garg, K Chandiramani International Journal of Indian Psychology 9 (1), 1232-46, 2021 | 6 | 2021 |
| First use of the energetiq 10w electrodeless euv plasma source G Denbeaux, P Naulleau, RGS Horne, M Besen 2005 International EUVL Symposium, San Diego, CA, 2005 | 6 | 2005 |
| Wavelength dependence of carbon contamination on mirrors with different capping layers P Thomas, L Yankulin, Y Khopkar, R Garg, C Mbanaso, A Antohe, YJ Fan, ... Extreme Ultraviolet (EUV) Lithography 7636, 622-629, 2010 | 5 | 2010 |
| Exploration of caregiver experience for children with ASD: An in-depth perspective N Gupta, M Khanna, R Garg, V Sethi, S Khattar, P Tekkar, S Maria, ... Advances in Autism 9 (3), 217-240, 2023 | 3 | 2023 |
| Extreme ultraviolet resist outgassing and its effect on nearby optics R Garg State University of New York at Albany, 2008 | 3 | 2008 |
| Actinic microscope for EUV masks using a stand-alone source for imaging and contamination studies of EUV masks G Denbeaux, YJ Fan, A Antohe, L Yankulin, R Garg, O Wood, F Goodwin, ... International EUVL Symposium, Sapporo, Japan, 28-31, 2007 | 3 | 2007 |
| Absorption of extreme ultraviolet radiation in photoresists R Garg, A Antohe, G Denbeaux Emerging Lithographic Technologies XI 6517, 802-806, 2007 | 2 | 2007 |
| Yoga Interventions in OCD and Depression: A Comprehensive Review N Mishra, R Garg International Journal of Indian Psychȯlogy 12 (1), 2024 | 1 | 2024 |
| Proximity printing using extreme ultraviolet radiation R Garg, P Naulleau, R Brainard, G Denbeaux Emerging Lithographic Technologies XII 6921, 1016-1021, 2008 | 1 | 2008 |
| Novel method for fabrication of high-efficiency diffractive optics for short wavelength radiation R Garg, J Evertsen, G Denbeaux Micromachining Technology for Micro-Optics and Nano-Optics IV 6110, 159-161, 2006 | 1 | 2006 |
