| Elastic relationships in layered composite media with approximation for the case of thin films on a thick substrate PH Townsend, DM Barnett, TA Brunner Journal of Applied Physics 62 (11), 4438-4444, 1987 | 500 | 1987 |
| Impact of lens aberrations on optical lithography TA Brunner IBM Journal of Research and Development 41 (1.2), 57-67, 1997 | 236 | 1997 |
| Optical metrology tool and method of using same CP Ausschnitt, TA Brunner US Patent 6,130,750, 2000 | 191 | 2000 |
| Focus and overlay characterization and optimization for photolithographic exposure TA Brunner US Patent 4,929,083, 1990 | 182 | 1990 |
| Approximate models for resist processing effects TA Brunner, RA Ferguson Optical Microlithography IX 2726, 198-207, 1996 | 173 | 1996 |
| Method of optical metrology of unresolved pattern arrays CP Ausschnitt, TA Brunner US Patent 5,805,290, 1998 | 151 | 1998 |
| Optical focus phase shift test pattern, monitoring system and process TA Brunner, MS Hibbs, BB Peck, CA Spence US Patent 5,300,786, 1994 | 142 | 1994 |
| Optimization of optical properties of resist processes TA Brunner Advances in Resist Technology and Processing VIII 1466, 297-308, 1991 | 136 | 1991 |
| Rotational energy transfer in Na*2 (A Σ) colliding with Xe, Kr, Ar, Ne, He, H2, CH4, and N2: Experiment and fitting laws TA Brunner, N Smith, AW Karp, DE Pritchard The Journal of Chemical Physics 74 (6), 3324-3341, 1981 | 125 | 1981 |
| Why optical lithography will live forever TA Brunner Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2003 | 122 | 2003 |
| Dynamical constraints on the transfer of angular momentum in rotationally inelastic collisions of I2 (B 3Π) with He and Xe SL Dexheimer, M Durand, TA Brunner, DE Pritchard The Journal of Chemical Physics 76 (10), 4996-5004, 1982 | 107 | 1982 |
| Rotational energy transfer in Na*2–Xe collisions: Level to level dynamics TA Brunner, RD Driver, N Smith, DE Pritchard The Journal of Chemical Physics 70 (9), 4155-4167, 1979 | 106 | 1979 |
| Pattern-dependent correction of mask topography effects for alternating phase-shifting masks RA Ferguson, AKK Wong, TA Brunner, LW Liebmann Optical/Laser Microlithography VIII 2440, 349-360, 1995 | 103 | 1995 |
| Quantitative stepper metrology using the focus monitor test mask TA Brunner, AL Martin, RM Martino, CP Ausschnitt, TH Newman, ... Optical/Laser Microlithography VII 2197, 541-549, 1994 | 92 | 1994 |
| 170-nm gates fabricated by phase-shift mask and top antireflector process TA Brunner, PN Sanda, M Wordeman, T Lii Optical/Laser Microlithography 1927, 182-189, 1993 | 90 | 1993 |
| High performance multi-mesa field effect transistor TA Brunner, LL Hsu, JA Mandelman, LK Wang US Patent 5,675,164, 1997 | 89 | 1997 |
| Simple Scaling Law for Rotational-Energy Transfer in Na 2*-Xe Collisions TA Brunner, RD Driver, N Smith, DE Pritchard Physical Review Letters 41 (13), 856, 1978 | 87 | 1978 |
| Apparatus for measuring overlay error TA Brunner US Patent 4,703,434, 1987 | 80 | 1987 |
| Optical metrology tool and method of using same CP Ausschnitt, TA Brunner US Patent 6,317,211, 2001 | 78 | 2001 |
| Power law scaling for rotational energy transfer DE Pritchard, N Smith, RD Driver, TA Brunner The Journal of Chemical Physics 70 (5), 2115-2120, 1979 | 78 | 1979 |
