| Stage device and pattern transfer system using the same H Itoh, S Ohishi, K Iwamoto, N Korenaga, Y Fukagawa, T Asano, ... US Patent 5,684,856, 1997 | 85 | 1997 |
| Illumination system and scan type exposure apparatus K Ozawa, E Sakamoto, K Takahashi, Y Fukagawa US Patent 6,081,319, 2000 | 30 | 2000 |
| Exposure apparatus and its control method, stage apparatus, and device manufacturing method M Yonekawa, Y Fukagawa US Patent 6,741,328, 2004 | 18 | 2004 |
| Exposure apparatus and its control method, stage apparatus, and device manufacturing method M Yonekawa, Y Fukagawa US Patent 6,330,052, 2001 | 18 | 2001 |
| Optimization of alignment in semiconductor lithography equipment R Miyashiro, Y Fukagawa Precision engineering 33 (4), 327-332, 2009 | 14 | 2009 |
| Distortion measurement method and exposure apparatus Y Fukagawa US Patent 6,947,119, 2005 | 11 | 2005 |
| Method, apparatus and medium for determining the intensity distribution formed on a pupil plane of an illumination optical system Y Gyoda, H Ishii, K Mikami, Y Fukagawa US Patent 8,811,714, 2014 | 10 | 2014 |
| Method and apparatus for determining chip arrangement position on substrate Y Fukagawa, M Nakamori US Patent 7,346,886, 2008 | 9 | 2008 |
| Optical apparatus, method of determining position of optical element in optical system, and device manufacturing method Y Fukagawa, T Yoshihara, M Nakamori, Y Shinano US Patent 7,301,615, 2007 | 9 | 2007 |
| Chip arrangement determining apparatus and method Y Fukagawa US Patent 6,854,105, 2005 | 9 | 2005 |
| Stage system in projection exposure apparatus Y Fukagawa, S Yabu US Patent App. 09/726,593, 2001 | 7 | 2001 |
| Determination method, exposure method and storage medium Y Gyoda, H Ishii, Y Fukagawa, Y Shinano US Patent 8,450,031, 2013 | 6 | 2013 |
| Optical apparatus, method of determining position of optical element in optical system, and device manufacturing method Y Fukagawa, T Yoshihara, M Nakamori, Y Shinano US Patent 7,230,692, 2007 | 6 | 2007 |
| Scanning exposure technique Y Fukagawa US Patent 7,084,957, 2006 | 5 | 2006 |
| An Application of Traveling-Salesman Models to Shot Sequence Generation for Scan Lithography Y Shinano, N Inui, Y Fukagawa, N Takakura 5th European Congress on Computational Methods in Applied Sciences and …, 2008 | 4 | 2008 |
| Imprint apparatus, imprint method, and article manufacturing method N Baba, Y Fukagawa US Patent App. 15/170,227, 2016 | 3 | 2016 |
| Exposure apparatus, method of obtaining amount of regulation of object to be regulated, program, and method of manufacturing article Y Fukagawa, Y Takano, S Kubo US Patent 9,310,695, 2016 | 3 | 2016 |
| Optimum adjustment for distortion in semiconductor lithography equipment Y Fukagawa, Y Shinano, M Nakamori Journal of Advanced Mechanical Design, Systems, and Manufacturing 2 (3), 378-384, 2008 | 3 | 2008 |
| Optimum Adjustment for Distortion in Semiconductor Lithography Equipment Y Fukagawa Transactions of the Japan Society of Mechanical Engineers 72 (722), 308-312, 2006 | 3 | 2006 |
| Optimizing movement sequences for step-and-scan lithography equipment Y Shinano, N Inui, Y Fukagawa, N Takakura Journal of Advanced Mechanical Design, Systems, and Manufacturing 7 (4), 608-618, 2013 | 2 | 2013 |
