| Development of an inorganic photoresist for DUV, EUV, and electron beam imaging M Trikeriotis, WJ Bae, E Schwartz, M Krysak, N Lafferty, P Xie, B Smith, ... Advances in Resist Materials and Processing Technology XXVII 7639, 120-129, 2010 | 88 | 2010 |
| Development of an inorganic nanoparticle photoresist for EUV, e-beam, and 193nm lithography M Krysak, M Trikeriotis, E Schwartz, N Lafferty, P Xie, B Smith, ... Advances in Resist Materials and Processing Technology XXVIII 7972, 408-413, 2011 | 83 | 2011 |
| Approaching the numerical aperture of water immersion lithography at 193-nm BW Smith, A Bourov, Y Fan, LV Zavyalova, NV Lafferty, FC Cropanese Optical Microlithography XVII 5377, 273-284, 2004 | 62 | 2004 |
| Water immersion optical lithography at 193 nm BW Smith, A Bourov, H Kang, F Cropanese, Y Fan, N Lafferty, ... Journal of Micro/Nanolithography, MEMS and MOEMS 3 (1), 44-51, 2004 | 52 | 2004 |
| Evanescent wave imaging in optical lithography BW Smith, Y Fan, J Zhou, N Lafferty, A Estroff Optical microlithography XIX 6154, 100-108, 2006 | 46 | 2006 |
| Progress towards the integration of optical proximity correction and directed self-assembly of block copolymers with graphoepitaxy CC Liu, J Pitera, N Lafferty, K Lai, C Rettner, M Tjio, N Arellano, J Cheng Alternative Lithographic Technologies IV 8323, 178-184, 2012 | 41 | 2012 |
| Design and manufacturability tradeoffs in unidirectional and bidirectional standard cell layouts in 14 nm node K Vaidyanathan, SH Ng, D Morris, N Lafferty, L Liebmann, M Bender, ... Design for Manufacturability through Design-Process Integration VI 8327, 164-175, 2012 | 38 | 2012 |
| Immersion microlithography at 193 nm with a Talbot prism interferometer A Bourov, Y Fan, FC Cropanese, NV Lafferty, LV Zavyalova, H Kang, ... Optical Microlithography XVII 5377, 1573-1578, 2004 | 37 | 2004 |
| Computational aspects of optical lithography extension by directed self-assembly K Lai, C Liu, J Pitera, DJ Dechene, A Schepis, J Abdallah, H Tsai, ... Optical Microlithography XXVI 8683, 868304, 2013 | 32 | 2013 |
| Immersion lithography fluids for high NA 193 nm lithography J Zhou, Y Fan, A Bourov, N Lafferty, F Cropanese, L Zavyalova, A Estroff, ... Optical Microlithography XVIII 5754, 630-637, 2005 | 30 | 2005 |
| Design of embedded memory and logic based on pattern constructs D Morris, K Vaidyanathan, N Lafferty, K Lai, L Liebmann, L Pileggi 2011 Symposium on VLSI Technology-Digest of Technical Papers, 104-105, 2011 | 26 | 2011 |
| Study of air-bubble-induced light scattering effect on image quality in 193-nm immersion lithography Y Fan, NV Lafferty, A Bourov, LV Zavyalova, BW Smith Optical Microlithography XVII 5377, 477-486, 2004 | 23 | 2004 |
| Mask induced polarization A Estroff, Y Fan, A Bourov, FC Cropanese, NV Lafferty, LV Zavyalova, ... Optical Microlithography XVII 5377, 1069-1080, 2004 | 21 | 2004 |
| Immersion lithography with numerical apertures above 2.0 using high index optical materials J Zhou, NV Lafferty, BW Smith, JH Burnett Optical Microlithography XX 6520, 1663-1671, 2007 | 20 | 2007 |
| ILSim: a compact simulation tool for interferometric lithography Y Fan, A Bourov, L Zavyalova, J Zhou, A Estroff, N Lafferty, BW Smith Optical Microlithography XVIII 5754, 1805-1816, 2005 | 19 | 2005 |
| Enhanced OPC recipe coverage and early hotspot detection through automated layout generation and analysis A Hamouda, M Bahnas, D Schumacher, I Graur, A Chen, K Madkour, H Ali, ... Optical Microlithography XXX 10147, 223-231, 2017 | 18 | 2017 |
| Computational lithography platform for 193i-guided directed self-assembly K Lai, M Ozlem, JW Pitera, C Liu, A Schepis, D Dechene, A Krasnoperova, ... Optical Microlithography XXVII 9052, 361-372, 2014 | 16 | 2014 |
| Hyper NA water immersion lithography at 193nm and 248nm BW Smith, Y Fan, J Zhou, A Bourov, L Zavyalova, N Lafferty, F Cropanese, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004 | 15 | 2004 |
| Exploring alternative EUV mask absorber for iN5 self-aligned block and contact layers R Sejpal, V Philipsen, A Armeanu, CI Wei, W Gillijns, N Lafferty, G Fenger, ... Photomask Technology 2019 11148, 265-276, 2019 | 14 | 2019 |
| Directed self-assembly (DSA) grapho-epitaxy template generation with immersion lithography Y Ma, J Lei, JA Torres, L Hong, J Word, G Fenger, A Tritchkov, ... Alternative Lithographic Technologies VII 9423, 23-33, 2015 | 14 | 2015 |
