Neal Lafferty
Neal Lafferty
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Development of an inorganic photoresist for DUV, EUV, and electron beam imaging
M Trikeriotis, WJ Bae, E Schwartz, M Krysak, N Lafferty, P Xie, B Smith, ...
Advances in Resist Materials and Processing Technology XXVII 7639, 120-129, 2010
Development of an inorganic nanoparticle photoresist for EUV, e-beam, and 193nm lithography
M Krysak, M Trikeriotis, E Schwartz, N Lafferty, P Xie, B Smith, ...
Advances in Resist Materials and Processing Technology XXVIII 7972, 408-413, 2011
Approaching the numerical aperture of water immersion lithography at 193-nm
BW Smith, A Bourov, Y Fan, LV Zavyalova, NV Lafferty, FC Cropanese
Optical Microlithography XVII 5377, 273-284, 2004
Water immersion optical lithography at 193 nm
BW Smith, A Bourov, H Kang, F Cropanese, Y Fan, N Lafferty, ...
Journal of Micro/Nanolithography, MEMS and MOEMS 3 (1), 44-51, 2004
Evanescent wave imaging in optical lithography
BW Smith, Y Fan, J Zhou, N Lafferty, A Estroff
Optical microlithography XIX 6154, 100-108, 2006
Progress towards the integration of optical proximity correction and directed self-assembly of block copolymers with graphoepitaxy
CC Liu, J Pitera, N Lafferty, K Lai, C Rettner, M Tjio, N Arellano, J Cheng
Alternative Lithographic Technologies IV 8323, 178-184, 2012
Design and manufacturability tradeoffs in unidirectional and bidirectional standard cell layouts in 14 nm node
K Vaidyanathan, SH Ng, D Morris, N Lafferty, L Liebmann, M Bender, ...
Design for Manufacturability through Design-Process Integration VI 8327, 164-175, 2012
Immersion microlithography at 193 nm with a Talbot prism interferometer
A Bourov, Y Fan, FC Cropanese, NV Lafferty, LV Zavyalova, H Kang, ...
Optical Microlithography XVII 5377, 1573-1578, 2004
Computational aspects of optical lithography extension by directed self-assembly
K Lai, C Liu, J Pitera, DJ Dechene, A Schepis, J Abdallah, H Tsai, ...
Optical Microlithography XXVI 8683, 868304, 2013
Immersion lithography fluids for high NA 193 nm lithography
J Zhou, Y Fan, A Bourov, N Lafferty, F Cropanese, L Zavyalova, A Estroff, ...
Optical Microlithography XVIII 5754, 630-637, 2005
Design of embedded memory and logic based on pattern constructs
D Morris, K Vaidyanathan, N Lafferty, K Lai, L Liebmann, L Pileggi
2011 Symposium on VLSI Technology-Digest of Technical Papers, 104-105, 2011
Mask induced polarization
A Estroff, Y Fan, A Bourov, FC Cropanese, NV Lafferty, LV Zavyalova, ...
Optical Microlithography XVII 5377, 1069-1080, 2004
Study of air-bubble-induced light scattering effect on image quality in 193-nm immersion lithography
Y Fan, NV Lafferty, A Bourov, LV Zavyalova, BW Smith
Optical Microlithography XVII 5377, 477-486, 2004
Immersion lithography with numerical apertures above 2.0 using high index optical materials
J Zhou, NV Lafferty, BW Smith, JH Burnett
Optical Microlithography XX 6520, 1663-1671, 2007
ILSim: a compact simulation tool for interferometric lithography
Y Fan, A Bourov, L Zavyalova, J Zhou, A Estroff, N Lafferty, BW Smith
Optical Microlithography XVIII 5754, 1805-1816, 2005
Enhanced OPC recipe coverage and early hotspot detection through automated layout generation and analysis
A Hamouda, M Bahnas, D Schumacher, I Graur, A Chen, K Madkour, H Ali, ...
Optical Microlithography XXX 10147, 223-231, 2017
Computational lithography platform for 193i-guided directed self-assembly
K Lai, M Ozlem, JW Pitera, C Liu, A Schepis, D Dechene, A Krasnoperova, ...
Optical Microlithography XXVII 9052, 361-372, 2014
Hyper NA water immersion lithography at 193nm and 248nm
BW Smith, Y Fan, J Zhou, A Bourov, L Zavyalova, N Lafferty, F Cropanese, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004
Exploring alternative EUV mask absorber for iN5 self-aligned block and contact layers
R Sejpal, V Philipsen, A Armeanu, CI Wei, W Gillijns, N Lafferty, G Fenger, ...
Photomask Technology 2019 11148, 265-276, 2019
Directed self-assembly (DSA) grapho-epitaxy template generation with immersion lithography
Y Ma, J Lei, JA Torres, L Hong, J Word, G Fenger, A Tritchkov, ...
Alternative Lithographic Technologies VII 9423, 23-33, 2015
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