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Stephen Rossnagel
Stephen Rossnagel
UVA Dept Mat. Sci.
Verified email at virginia.edu
Title
Cited by
Cited by
Year
Handbook of plasma processing technology: fundamentals, etching, deposition, and surface interactions
SM Rossnagel, JJ Cuomo, WD Westwood
(No Title), 1990
1138*1990
Alteration of Cu conductivity in the size effect regime
SM Rossnagel, TS Kuan
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004
5402004
Metal ion deposition from ionized mangetron sputtering discharge
SM Rossnagel, J Hopwood
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1994
5031994
METHOD OF PE-ALD OF SiNxCy AND INTEGRATION OF LINER MATERIALS ON POROUS LOW K SUBSTRATES
AJ Kellock, H Kim, DG Park, SV Nitta, S Purushothaman, S Rossnagel, ...
US Patent App. 12/203,338, 2010
4242010
Magnetron sputter deposition with high levels of metal ionization
SM Rossnagel, J Hopwood
Applied physics letters 63 (24), 3285-3287, 1993
3811993
Gas density reduction effects in magnetrons
SM Rossnagel
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 6 (1 …, 1988
3471988
Ionic field effect transistors with sub-10 nm multiple nanopores
SW Nam, MJ Rooks, KB Kim, SM Rossnagel
Nano letters 9 (5), 2044-2048, 2009
3152009
Thin film deposition with physical vapor deposition and related technologies
SM Rossnagel
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 21 (5 …, 2003
3042003
Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
SM Rossnagel, A Sherman, F Turner
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2000
2962000
Structure for confining the switching current in phase memory (PCM) cells
GW Burr, CH Lam, S Raoux, SM Rossnagel, AG Schrott, JZ Sun, ...
US Patent 7,488,967, 2009
2872009
Directional and ionized physical vapor deposition for microelectronics applications
SM Rossnagel
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1998
2181998
Collimated magnetron sputter deposition
SM Rossnagel, D Mikalsen, H Kinoshita, JJ Cuomo
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 9 (2 …, 1991
1981991
Phase transformation of thin sputter-deposited tungsten films at room temperature
SM Rossnagel, IC Noyan, C Cabral Jr
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2002
1862002
Systems and methods for controlling position of charged polymer inside nanopore
S Polonsky, SM Rossnagel, GA Stolovitzky
US Patent 8,003,319, 2011
1812011
Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
H Kim, C Cabral Jr, C Lavoie, SM Rossnagel
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2002
1652002
Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
H Kim, C Detavenier, O Van der Straten, SM Rossnagel, AJ Kellock, ...
Journal of applied physics 98 (1), 2005
1622005
Film modification by low energy ion bombardment during deposition
SM Rossnagel, JJ Cuomo
Thin Solid Films 171 (1), 143-156, 1989
1591989
Current–voltage relations in magnetrons
SM Rossnagel, HR Kaufman
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 6 (2 …, 1988
1551988
Sputter deposition for semiconductor manufacturing
SM Rossnagel
IBM Journal of Research and development 43 (1.2), 163-179, 1999
1541999
Novel lithography-independent pore phase change memory
M Breitwisch, T Nirschl, CF Chen, Y Zhu, MH Lee, M Lamorey, GW Burr, ...
2007 IEEE Symposium on VLSI Technology, 100-101, 2007
1452007
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