| 22 nm technology compatible fully functional 0.1 μm26T-SRAM cell BS Haran, A Kumar, L Adam, J Chang, V Basker, S Kanakasabapathy, ... 2008 IEEE International Electron Devices Meeting, 1-4, 2008 | 96 | 2008 |
| Integration of EUV lithography in the fabrication of 22-nm node devices O Wood, CS Koay, K Petrillo, H Mizuno, S Raghunathan, J Arnold, ... Alternative lithographic technologies 7271, 50-59, 2009 | 78 | 2009 |
| Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process K Lai, AE Rosenbluth, S Bagheri, J Hoffnagle, K Tian, D Melville, ... Optical Microlithography XXII 7274, 82-93, 2009 | 71 | 2009 |
| X-ray nanolithography: Extension to the limits of the lithographic process HI Smith, ML Schattenburg, SD Hector, J Ferrera, EE Moon, IY Yang, ... Microelectronic Engineering 32 (1-4), 143-158, 1996 | 69 | 1996 |
| Impact of resist blur on MEF, OPC, and CD control TA Brunner, C Fonseca, N Seong, M Burkhardt Optical Microlithography XVII 5377, 141-149, 2004 | 62 | 2004 |
| Illuminator design for the printing of regular contact patterns M Burkhardt, A Yen, C Progler, G Wells Microelectronic engineering 41, 91-95, 1998 | 61 | 1998 |
| Structure and method for fixing phase effects on EUV mask M Burkhardt, EEF Gallagher US Patent 9,551,924, 2017 | 44 | 2017 |
| Insertion strategy for EUV lithography O Wood, J Arnold, T Brunner, M Burkhardt, JHC Chen, D Civay, SSC Fan, ... Extreme Ultraviolet (EUV) Lithography III 8322, 32-39, 2012 | 41 | 2012 |
| EUV patterning successes and frontiers N Felix, D Corliss, K Petrillo, N Saulnier, Y Xu, L Meli, H Tang, A De Silva, ... Extreme Ultraviolet (EUV) Lithography VII 9776, 480-486, 2016 | 39 | 2016 |
| Fundamental investigation of negative tone development (NTD) for the 22nm node (and beyond) G Landie, Y Xu, S Burns, K Yoshimoto, M Burkhardt, L Zhuang, K Petrillo, ... Advances in Resist Materials and Processing Technology XXVIII 7972, 51-62, 2011 | 37 | 2011 |
| Investigation of alternate mask absorbers in EUV lithography M Burkhardt Extreme Ultraviolet (EUV) Lithography VIII 10143, 195-208, 2017 | 36 | 2017 |
| Modeling and experiments of non-telecentric thick mask effects for EUV lithography G McIntyre, C Koay, M Burkhardt, H Mizuno, OR Wood II Alternative Lithographic Technologies 7271, 385-396, 2009 | 36 | 2009 |
| Best focus shift mechanism for thick masks M Burkhardt, A Raghunathan Extreme Ultraviolet (EUV) Lithography VI 9422, 276-288, 2015 | 34 | 2015 |
| Pitch-based subresolution assist feature design LW Liebmann, AH Gabor, RL Gordon, CA Fonseca, M Burkhardt US Patent 6,964,032, 2005 | 34 | 2005 |
| EUV lithography at the 22nm technology node O Wood, CS Koay, K Petrillo, H Mizuno, S Raghunathan, J Arnold, ... Extreme Ultraviolet (EUV) Lithography 7636, 558-565, 2010 | 33 | 2010 |
| Soluble MHC complexes and methods of use thereof PR Rhode, J Acevedo, M Burkhardt, JA Jiao, HC Wong US Patent 7,074,905, 2006 | 33 | 2006 |
| Method for monitoring focus in EUV lithography TA Brunner, M Burkhardt US Patent 9,588,440, 2017 | 31 | 2017 |
| Investigation of mask absorber induced image shift in EUV lithography M Burkhardt, A De Silva, J Church, L Meli, C Robinson, N Felix Extreme Ultraviolet (EUV) Lithography X 10957, 232-250, 2019 | 27 | 2019 |
| Method and apparatus for amplitude filtering in the frequency plane of a lithographic projection system S Butt, M Burkhardt US Patent 6,940,583, 2005 | 26 | 2005 |
| Trilayer development for 193 nm immersion lithography S Burns, M Burkhardt, D Goldfarb, N Lustig, D Pfeiffer, MJ Brodsky, ... Journal of Photopolymer Science and Technology 20 (5), 679-686, 2007 | 25 | 2007 |
