| Field-portable reflection and transmission microscopy based on lensless holography M Lee, O Yaglidere, A Ozcan Biomedical optics express 2 (9), 2721-2730, 2011 | 171 | 2011 |
| Microsphere-assisted, nanospot, non-destructive metrology for semiconductor devices S Kwon, J Park, K Kim, Y Cho, M Lee Light: Science & Applications 11 (1), 32, 2022 | 47 | 2022 |
| Improved slow-light delay performance of a broadband stimulated Brillouin scattering system using fiber Bragg gratings M Lee, R Pant, MA Neifeld Applied Optics 47 (34), 6404-6415, 2008 | 38 | 2008 |
| Modern Trends in Imaging VIII: Lensfree Computational Microscopy Tools for Cell and Tissue Imaging at the Point‐of‐Care and in Low‐Resource Settings SO Isikman, A Greenbaum, M Lee, W Bishara, O Mudanyali, TW Su, ... Analytical Cellular Pathology 35 (4), 229-247, 2012 | 35 | 2012 |
| SBS gain-based slow-light system with a Fabry–Perot resonator M Lee, R Pant, MD Stenner, MA Neifeld Optics communications 281 (10), 2975-2984, 2008 | 19 | 2008 |
| High-fidelity, broadband stimulated-Brillouin-scattering-based slow light using fast noise modulation Y Zhu, M Lee, MA Neifeld, DJ Gauthier Optics Express 19 (2), 687-697, 2011 | 17 | 2011 |
| Fourier ptychographic topography H Wang, J Zhu, J Sung, G Hu, J Greene, Y Li, S Park, W Kim, M Lee, ... Optics Express 31 (7), 11007-11018, 2023 | 16 | 2023 |
| Metrology using overlay and yield critical patterns D Kandel, MD Smith, M Wagner, E Amit, M Lee US Patent 10,685,165, 2020 | 16 | 2020 |
| Toward realization of high-throughput hyperspectral imaging technique for semiconductor device metrology C Yoon, G Park, D Han, S Im, S Jo, J Kim, W Kim, C Choi, M Lee Journal of Micro/Nanopatterning, Materials, and Metrology 21 (2), 021209-021209, 2022 | 13 | 2022 |
| Information-theoretic analysis of a stimulated-Brillouin-scattering-based slow-light system M Lee, Y Zhu, DJ Gauthier, ME Gehm, MA Neifeld Applied optics 50 (32), 6063-6072, 2011 | 13 | 2011 |
| Information theoretic framework for the analysis of a slow-light delay device MA Neifeld, M Lee JOSA B 25 (12), C31-C38, 2008 | 12 | 2008 |
| Improving SEM image quality using pixel super resolution technique M Lee, J Cantone, J Xu, L Sun, R Kim Metrology, Inspection, and Process Control for Microlithography XXVIII 9050 …, 2014 | 11 | 2014 |
| Systematic design study of an all-optical delay line based on Brillouin scattering enhanced cascade coupled ring resonators M Lee, ME Gehm, MA Neifeld Journal of Optics 12 (10), 104012, 2010 | 10 | 2010 |
| Metrology target design for tilted device designs M Lee, MD Smith, ME Adel, E Amit, D Kandel US Patent App. 15/287,388, 2017 | 8 | 2017 |
| Lensfree computational microscopy tools for cell and tissue imaging at the point-of-care and in low-resource settings SO Isikman, A Greenbaum, M Lee, W Bishara, O Mudanyali, TW Su, ... Biophotonics in Pathology, 299-323, 2013 | 8 | 2013 |
| Distributed fiber optic intrusion detection system with improved sensitivity M Lee, HF Taylor Optical Fiber Sensors, WB6, 2006 | 8 | 2006 |
| Multi spectral holographic ellipsometry for a complex 3D nanostructure J Jung, W Kim, J Kim, S Lee, I Shin, C Yoon, S Jeong, Y Hidaka, ... Optics Express 30 (26), 46956-46971, 2022 | 7 | 2022 |
| Lithography aware overlay metrology target design method M Lee, MD Smith, J Lee, M Jung, H Lee, Y Kim, S Han, ME Adel, K Lee, ... Metrology, Inspection, and Process Control for Microlithography XXX 9778, 97781L, 2016 | 7 | 2016 |
| A breakthrough on throughput and accuracy limitation in ellipsometry using self-interference holographic analysis J Jung, Y Hidaka, J Kim, M Numata, W Kim, S Ueyama, M Lee Metrology, Inspection, and Process Control for Semiconductor Manufacturing …, 2021 | 6 | 2021 |
| System and method for fabricating metrology targets oriented with an angle rotated with respect to device features M Lee, MD Smith US Patent 10,018,919, 2018 | 6 | 2018 |
Aydogan OzcanChancellor's Professor at UCLA & HHMI ProfessorVerified email at ucla.edu
