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Antoine Islegen-Wojdyla
Antoine Islegen-Wojdyla
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Title
Cited by
Cited by
Year
Brewster’s angle silicon wafer terahertz linear polarizer
A Wojdyla, G Gallot
Optics Express 19 (15), 14099-14107, 2011
622011
Attenuated internal reflection terahertz imaging
A Wojdyla, G Gallot
Optics Letters 38 (2), 112-114, 2013
372013
Adaptive shape control of wavefront-preserving X-ray mirrors with active cooling and heating
D Cocco, C Hardin, D Morton, L Lee, ML Ng, L Zhang, L Assoufid, ...
Optics express 28 (13), 19242-19254, 2020
332020
Actinic mask imaging: recent results and future directions from the SHARP EUV microscope
KA Goldberg, MP Benk, A Wojdyla, I Mochi, SB Rekawa, AP Allezy, ...
Extreme Ultraviolet (EUV) Lithography V 9048, 249-258, 2014
272014
Demonstration of 22-nm half pitch resolution on the SHARP EUV microscope
MP Benk, KA Goldberg, A Wojdyla, CN Anderson, F Salmassi, ...
Journal of Vacuum Science & Technology B 33 (6), 2015
202015
Mask blank defect printability comparison using optical and SEM mask and wafer inspection and bright field actinic mask imaging
P Mangat, E Verduijn, OR Wood II, MP Benk, A Wojdyla, KA Goldberg
Photomask Japan 2015: Photomask and Next-Generation Lithography Mask …, 2015
172015
Beam waist measurement for terahertz time-domain spectroscopy experiments
A Podzorov, A Wojdyla, G Gallot
Optics letters 35 (7), 901-903, 2010
162010
New ways of looking at masks with the SHARP EUV microscope
KA Goldberg, MP Benk, A Wojdyla, DG Johnson, AP Donoghue
Extreme Ultraviolet (EUV) Lithography VI 9422, 404-414, 2015
152015
Enhancing defect detection with Zernike phase contrast in EUV multilayer blank inspection
YG Wang, R Miyakawa, W Chao, M Benk, A Wojdyla, A Donoghue, ...
Extreme Ultraviolet (EUV) Lithography VI 9422, 420-429, 2015
142015
Compensation of heat load deformations using adaptive optics for the ALS upgrade: a wave optics study
M Sanchez del Rio, A Wojdyla, KA Goldberg, GD Cutler, D Cocco, ...
Journal of synchrotron radiation 27 (5), 1141-1152, 2020
132020
EUV photolithography mask inspection using Fourier ptychography
A Wojdyla, MP Benk, PP Naulleau, KA Goldberg
Image Sensing Technologies: Materials, Devices, Systems, and Applications V …, 2018
132018
Ultrahigh efficiency EUV contact-hole printing with chromeless phase shift mask
P Naulleau, CN Anderson, W Chao, KA Goldberg, E Gullikson, ...
Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation …, 2016
122016
Phase measurements of EUV mask defects
RA Claus, YG Wang, AJ Wojdyla, MP Benk, KA Goldberg, AR Neureuther, ...
Extreme Ultraviolet (EUV) Lithography VI 9422, 376-381, 2015
122015
Aerial imaging study of the mask-induced line-width roughness of EUV lithography masks
A Wojdyla, A Donoghue, MP Benk, PP Naulleau, KA Goldberg
Extreme Ultraviolet (EUV) Lithography VII 9776, 133-141, 2016
92016
Measurement of EUV lithography pupil amplitude and phase variation via image-based methodology
Z Levinson, E Verduijn, OR Wood, P Mangat, KA Goldberg, MP Benk, ...
Journal of Micro/Nanolithography, MEMS, and MOEMS 15 (2), 023508-023508, 2016
92016
Real-time machine-learning-driven control system of a deformable mirror for achieving aberration-free X-ray wavefronts
L Rebuffi, X Shi, Z Qiao, MJ Highland, MG Frith, A Wojdyla, KA Goldberg, ...
Optics express 31 (13), 21264-21279, 2023
82023
Binary amplitude reflection gratings for X-ray shearing and Hartmann wavefront sensors
KA Goldberg, A Wojdyla, D Bryant
Sensors 21 (2), 536, 2021
82021
Extreme ultraviolet microscope characterization using photomask surface roughness
G Gunjala, A Wojdyla, S Sherwin, A Shanker, MP Benk, KA Goldberg, ...
Scientific reports 10 (1), 11673, 2020
82020
Emulation of anamorphic imaging on the SHARP extreme ultraviolet mask microscope
MP Benk, A Wojdyla, W Chao, F Salmassi, S Oh, YG Wang, RH Miyakawa, ...
Journal of Micro/Nanolithography, MEMS, and MOEMS 15 (3), 033501-033501, 2016
82016
Design and demonstration of tunable soft x-ray lateral shearing and Hartmann wavefront sensors
A Wojdyla, D Bryant, W Chao, L Assoufid, D Cocco, M Idir, KA Goldberg
Advances in X-Ray/EUV Optics and Components XIII 10760, 21-31, 2018
72018
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