| Real space soft x-ray imaging at 10 nm spatial resolution W Chao, P Fischer, T Tyliszczak, S Rekawa, E Anderson, P Naulleau Optics express 20 (9), 9777-9783, 2012 | 282 | 2012 |
| Extreme-ultraviolet phase-shifting point-diffraction interferometer: a wave-front metrology tool with subangstrom reference-wave accuracy PP Naulleau, KA Goldberg, SH Lee, C Chang, D Attwood, J Bokor Applied Optics 38 (35), 7252-7263, 1999 | 145 | 1999 |
| Hartmann wave-front measurement at 13.4 nm with λEUV/120 accuracy P Mercère, P Zeitoun, M Idir, S Le Pape, D Douillet, X Levecq, G Dovillaire, ... Optics letters 28 (17), 1534-1536, 2003 | 129 | 2003 |
| Status of EUV micro-exposure capabilities at the ALS using the 0.3-NA MET optic P Naulleau, KA Goldberg, EH Anderson, K Bradley, R Delano, P Denham, ... Emerging Lithographic Technologies VIII 5374, 881-891, 2004 | 113 | 2004 |
| Directly patterned inorganic hardmask for EUV lithography JK Stowers, A Telecky, M Kocsis, BL Clark, DA Keszler, A Grenville, ... Extreme Ultraviolet (EUV) Lithography II 7969, 386-396, 2011 | 101 | 2011 |
| Nanofabrication handbook S Cabrini, S Kawata CRC press, 2012 | 98 | 2012 |
| Extreme ultraviolet carrier-frequency shearing interferometry of a lithographic four-mirror optical system PP Naulleau, KA Goldberg, J Bokor Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2000 | 94 | 2000 |
| Critical challenges for EUV resist materials PP Naulleau, CN Anderson, LM Baclea-An, P Denham, S George, ... Advances in Resist Materials and Processing Technology XXVIII 7972, 17-26, 2011 | 91 | 2011 |
| Fourier-synthesis custom-coherence illuminator for extreme ultraviolet microfield lithography PP Naulleau, KA Goldberg, P Batson, J Bokor, P Denham, S Rekawa Applied Optics 42 (5), 820-826, 2003 | 91 | 2003 |
| Need for LWR metrology standardization: the imec roughness protocol GF Lorusso, T Sutani, V Rutigliani, F Van Roey, A Moussa, AL Charley, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 17 (4), 041009-041009, 2018 | 87 | 2018 |
| Biological soft X-ray tomography on beamline 2.1 at the Advanced Light Source MA Le Gros, G McDermott, BP Cinquin, EA Smith, M Do, WL Chao, ... Journal of synchrotron radiation 21 (6), 1370-1377, 2014 | 83 | 2014 |
| Resolution, LER, and sensitivity limitations of photoresists GM Gallatin, P Naulleau, D Niakoula, R Brainard, E Hassanein, R Matyi, ... Emerging Lithographic Technologies XII 6921, 417-427, 2008 | 83 | 2008 |
| System integration and performance of the EUV engineering test stand DA Tichenor, AK Ray-Chaudhuri, WC Replogle, RH Stulen, GD Kubiak, ... Emerging Lithographic Technologies V 4343, 19-37, 2001 | 81 | 2001 |
| Fundamental limits to EUV photoresist GM Gallatin, P Naulleau, R Brainard Advances in Resist Materials and Processing Technology XXIV 6519, 387-396, 2007 | 79 | 2007 |
| Line-edge roughness transfer function and its application to determining mask effects in EUV resist characterization PP Naulleau, GM Gallatin Applied Optics 42 (17), 3390-3397, 2003 | 79 | 2003 |
| Spatial coherence characterization of undulator radiation C Chang, P Naulleau, E Anderson, D Attwood Optics communications 182 (1-3), 25-34, 2000 | 78 | 2000 |
| EUV engineering test stand DA Tichenor, GD Kubiak, WC Replogle, LE Klebanoff, JB Wronosky, ... Emerging Lithographic Technologies IV 3997, 48-69, 2000 | 78 | 2000 |
| Tunable coherent radiation in the soft X-ray and extreme ultraviolet spectral regions DT Attwood, P Naulleau, KA Goldberg, E Tejnil, C Chang, R Beguiristain, ... IEEE Journal of Quantum Electronics 35 (5), 709-720, 1999 | 76 | 1999 |
| Microscopy of extreme ultraviolet lithography masks with 13.2 nm tabletop laser illumination F Brizuela, Y Wang, CA Brewer, F Pedaci, W Chao, EH Anderson, Y Liu, ... Optics letters 34 (3), 271-273, 2009 | 73 | 2009 |
| Resist Materials for Extreme Ultraviolet Lithography: Toward Low‐Cost Single‐Digit‐Nanometer Patterning PD Ashby, DL Olynick, DF Ogletree, PP Naulleau Advanced Materials 27 (38), 5813-5819, 2015 | 67 | 2015 |
