Comparative study of thermally cured and electron-beam-exposed hydrogen silsesquioxane resists S Choi, MJ Word, V Kumar, I Adesida
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2008
75 2008 The effects of molecular weight on the exposure characteristics of poly (methylmethacrylate) developed at low temperatures M Yan, S Choi, KRV Subramanian, I Adesida
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2008
55 2008 Effects of developer temperature on electron-beam-exposed hydrogen silsesquioxane resist for ultradense silicon nanowire fabrication S Choi, N Jin, V Kumar, I Adesida, M Shannon
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2007
41 2007 Fabrication of triangular nanochannels using the collapse of hydrogen silsesquioxane resists S Choi, M Yan, I Adesida
Applied Physics Letters 93 (16), 2008
36 2008 Ultra-dense hydrogen silsesquioxane (HSQ) structures on thin silicon nitride membranes S Choi, M Yan, L Wang, I Adesida
Microelectronic engineering 86 (4-6), 521-523, 2009
20 2009 Effects of salty-developer temperature on electron-beam-exposed hydrogen silsesquioxane resist for ultradense pattern transfer M Yan, J Lee, B Ofuonye, S Choi, JH Jang, I Adesida
Journal of Vacuum Science & Technology B, Nanotechnology and …, 2010
19 2010 Ultradense gold nanostructures fabricated using hydrogen silsesquioxane resist and applications for surface-enhanced Raman spectroscopy S Choi, M Yan, I Adesida, KH Hsu, NX Fang
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2009
13 2009 Nanometer-scale gaps in hydrogen silsesquioxane resist for -gate fabrication N Jin, S Choi, L Wang, G Chen, DH Kim, V Kumar, I Adesida
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2007
2 2007 Investigation of surface roughness of poly (methylmethacrylate) developed at reduced temperatures M Yan, S Choi, J Lee, KRV Subramanian, I Adesida
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2009
1 2009 Nanolithography and nanofabrication using hydrogen silsesquioxane resists SK Choi
University of Illinois at Urbana-Champaign, 2009
2009